Workshop "Beams & More"

9th Workshop "Beams & More"

We are currently working with a construction site because
the extension of our facility by 450 m2 more clean room is underway. It will be completed in mid-2012 and as announced early this year the new Vistec e-beam system will be the first
tool in our new facility. This latest generation writer is equipped with an air-bearing stage and allows pattern generation with a high positioning accuracy for large variety of substrates.

This upgrade will set the unique infrastructure at IMS CHIPS for low/mid volume production of complex nano structures on both, wafers and square mask substrates for the next decade.

In addition to our activities in the development and fabrication of specific optical components our work throughout the last year has been focused on micromechanical and MEMS projects as well as on complex, partially multilayer stamps dedicated for various replication techniques.

This year's workshop will include our partner report about progress in optical, e-beam and EUV lithography as well as an update about new achievements in imprint technology and presentations on micromechanical applications.

I look forward to seeing you in Stuttgart at the end of October.

Sincerely,

Mathias Irmscher